PRODUCT
Applications
Semiconductor、IC Package、IC Substrate
Chrome Mask Reticle Products and process
Reticles are one of the most critical tool used during IC manufacturing process. Reticles are normally manufactured to order. The tooling engineer first integrates customer’s data known as the pattern using CAD software, followed bye-beam(by e-beam) or laser beam writer that prints the circuits onto the photoresist-covered mask blank. After the process of developing, etching and strip, the reticle blank becomes the glass reticle which must go through measurement of critical dimensions(CD), registration and defect inspection to meet customers’ requirements before cleaning and pelliclization for delivery.
Standard Product and Specification
A.1X Photomask
Magnification
1X
1X
Material
SL GlassX
Quartz
Dimension
5”、6”、7”、9”
4”、5”、6”、7”
Wafer Exposure Type
PLA Aligner (copies)
PE, MPA (Projector)
CD
±0.3µm
±0.1µm
Registration
±0.2µm
±0.2µm
Defect
≦2dpsi@2µm
≦2dpsi@1µm
B.UT 1X Reticle
-Reticle material：Quartz
-Reticle dimension：3”x5”、5”x5”、6”x6”
-CD Tolerance：±0.1µm
-Registration：±0.1µm
-Defect：±0.5µm
C.5X、4X、2.5X、2X、Reticle for stepper
-Reticle material：Quartz
-Reticle dimension：5”x5”x0.09、6”x6”x0.12、6”x6”x0.25
-Stepper Type：ASML, NIKON, CANON
-CD Tolerance：Mean to target ≧ 0.015µm,Uniformity (3δ) ≧ 0.020µm
-Registration：±0.03µm
-Defect：±0.15µm
D.Large Area Mask (LAM)
Mask Material / Size
Max.: 24”x32” Chrome
Min Line / Space
6µm
Line Tolerance
±0.1µm
Mask Defect
3µm
Advanced Reticle Technology For 90nm~130nm
According to the lithography requirement is blooming for advanced reticle on 90nm~130nm wafer fabrication. TMC(We) set up a advanced reticle process by using CAR(Chemically Amplified Resist), high end E-Beam pattern generator(Toshi-ba EMB-4000/JBX3040MV) and dry etching technology for advanced reticle mass production.
By optimizing the high resolution capability of CAR, high end E-Beam pattern generator and dry etching process, TMC(We) can not only increasing capacity, shortening circle time and also set up different process type for OPC, PSM and advanced reticle. These high quality reticles accompany with best service, TMC(We) can meet all the requirements of different customer and lithography.
